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Interfacial Electronic Properties and Tunable Contact Types in Graphene/Janus MoGeSiN4Heterostructures

Binh, N.T.T. and Nguyen, C.Q. and Vu, T.V. and Nguyen, C.V. (2021) Interfacial Electronic Properties and Tunable Contact Types in Graphene/Janus MoGeSiN4Heterostructures. Journal of Physical Chemistry Letters, 12 (16). pp. 3934-3940. ISSN 19487185

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Abstract

Two-dimensional MoSi2N4 is an emerging class of 2D MA2N4 family, which has recently been synthesized in experiment. Herein, we construct ultrathin van der Waals heterostructures between graphene and a new 2D Janus MoGeSiN4 material and investigate their interfacial electronic properties and tunable Schottky barriers and contact types using first-principles calculations. The GR/MoGeSiN4 vdWHs are expected to be energetically favorable and stable. The high carrier mobility in graphene/MoGeSiN4 vdWHs makes them suitable for high-speed nanoelectronic devices. Furthermore, depending on the stacking patterns, either an n-type or a p-type Schottky contact is formed at the GR/MoGeSiN4 interface. The strain engineering and electric field can lead to the transformation from an n-type to a p-type Schottky contact or from Schottky to Ohmic contact in graphene/MoGeSiN4 heterostructure. These findings provide useful guidance for designing controllable Schottky nanodevices based on graphene/MoGeSiN4 heterostructures with high-performance. © 2021 American Chemical Society.

Item Type: Article
Divisions: Faculties > Faculty of Mechanical Engineering
Identification Number: 10.1021/acs.jpclett.1c00682
Uncontrolled Keywords: Calculations; Electric fields; Electronic properties; Germanium compounds; Hall mobility; Hole mobility; Ohmic contacts; Schottky barrier diodes; Silicon; Silicon compounds; Van der Waals forces; First-principles calculation; High carrier mobility; Nanoelectronic devices; Schottky barriers; Schottky contacts; Stacking patterns; Strain engineering; Van der waals; Graphene
Additional Information: Language of original document: English.
URI: http://eprints.lqdtu.edu.vn/id/eprint/8656

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