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Two-dimensional van der Waals graphene/transition metal nitride heterostructures as promising high-performance nanodevices

Pham, K.D. and Nguyen, C.Q. and Nguyen, C.V. and Cuong, P.V. and Hieu, N.V. (2021) Two-dimensional van der Waals graphene/transition metal nitride heterostructures as promising high-performance nanodevices. New Journal of Chemistry, 45 (12). pp. 5509-5516. ISSN 11440546

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Abstract

Graphene-based van der Waals (vdW) heterostructures have attracted much attention because they can enhance the properties of separated materials, possess numerous new phenomena and unusual properties and improve the performance of devices. Motivated by the successful fabrication of single-layer transition metal nitrides (TMNs) [Science, 2020,369, 670], we investigate the interfacial properties of heterostructures formed by stacking graphene (GR) on two different TMN monolayers, MoGe2N4(MGN) and MoSi2N4(MSN). Both the GR/MGN and GR/MSN heterostructures are characterized by weak vdW interactions, which preserve the intrinsic electronic properties of both the GR and TMN monolayers. The GR/MGN heterostructure forms an n-type Schottky contact, while a p-type Schottky contact is formed at the GR/MSN interface. Both the barrier and contact types in the GR/MGN heterostructure are sensitive to the electric gating and interlayer coupling. The transformation from an n-type Schottky contact to a p-type one or to an n-type ohmic contact can be achieved in the GR/MGN heterostructure by applying electric gating. In addition, adjusting the interlayer spacings between the GR and MGN layers leads to a transition from n-type to p-type Schottky contact. Our findings demonstrate that the GR/TMN heterostructures can be considered as promising high-performance nanodevices. © The Royal Society of Chemistry and the Centre National de la Recherche Scientifique 2021.

Item Type: Article
Divisions: Faculties > Faculty of Mechanical Engineering
Identification Number: 10.1039/d1nj00374g
Uncontrolled Keywords: Electronic properties; Graphene; Monolayers; Nanostructured materials; Nitrides; Ohmic contacts; Refractory metal compounds; Transition metals; Electric gating; Interfacial property; Interlayer coupling; Interlayer spacings; N-type ohmic contact; Performance of devices; Schottky contacts; Transition metal nitrides; Van der Waals forces; graphene; transition element; Article; chemical interaction; chemical structure; hexagonal crystal; priority journal
Additional Information: Language of original document: English.
URI: http://eprints.lqdtu.edu.vn/id/eprint/8670

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