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Simple method for fabrication of microchannels in silicon carbide

Khuat, V. and Si, J. and Chen, T. and Dao, V. and Hou, X. (2015) Simple method for fabrication of microchannels in silicon carbide. Journal of Laser Applications, 27 (2): 22002. ISSN 1042346X

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Abstract

By using 800-nm femtosecond laser irradiation and chemical selective etching with hydrofluoric acid, microchannels are fabricated in silicon carbide. The diameter of the microchannel is about 1.5 lm. The morphology of the channel is characterized by using scanning electronic microscopy equipped with an energy dispersive X-ray spectroscopy. The formation mechanism of silicon carbide channels is attributed to the formation of laser-induced structural change zones in silicon carbide and the reaction of the laser-induced structural change zones with hydrofluoric acid. In addition, the influences of the laser average power and scanning velocity on the position of the microchannel are discussed. VC 2015 Laser Institute of America.

Item Type: Article
Divisions: Faculties > Faculty of Information Technology
Faculties > Faculty of Physical and Chemical Engineering
Identification Number: 10.2351/1.4906079
Uncontrolled Keywords: Energy dispersive spectroscopy; Etching; Fabrication; Femtosecond lasers; Hydrofluoric acid; Microchannels; 6H-SiC; Chemical etching; Energy dispersive X ray spectroscopy; Formation mechanism; Laser average power; Laser Institute of America; Scanning electronic microscopy; Scanning velocity; Silicon carbide
Additional Information: Language of original document: English.
URI: http://eprints.lqdtu.edu.vn/id/eprint/9923

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